Photo Etching & Chemical Milling Equipment

XLi with External Automatic Pressure Adjust

Control the spray pressure of each spray tube using the PLC instead of the throttling screw.

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• Etcher (Stand Alone)
• SES (Strip – Etch – Strip)

Common Chemicals

• Alkaline Etchant
• Cupric Chloride Etchant
• Ferric chloride Etchant
• Hydrofluoric Acid (HF)
• Micro etch

Common Materials Etched

• Aluminum
• Copper
• Glass
• Steel
• Titanium
• And more

XLi Chemical Cleaning System

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Cleaner (Stand Alone)
• Alkaline Clean to Acid Clean
• Custom Size (1 to as many chambers as you want)

Common Chemicals

• Acid Cleaner
• Alkaline Cleaner

XLi Developing Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• Developer (Stand Alone)
• DES (Develop – Etch – Strip)

Common Chemicals

• 1% Potassium Carbonate
• 1% Sodium Carbonate

XLi Etching Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• Etcher (Stand Alone)
• SES (Strip – Etch – Strip)

Common Chemicals

• Alkaline Etchant
• Cupric Chloride Etchant
• Ferric chloride Etchant
• Hydrofluoric Acid (HF)
• Micro etch

Common Materials Etched

• Aluminum
• Copper
• Glass
• Steel
• Titanium
• And more

XLi Stripping Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• SES (Strip – Etch – Strip)
• Stripper (Stand Alone)

Common Chemicals

• Metal Resist Stripper
• Proprietary Aqueous or Semi-Aqueous Stripper
• Potassium Hydroxide
• Sodium Hydroxide

121 Brush Cleaner

Features

• Wet Brushing
• Oscillating Brushes
• Choice of bristle or compressed brushes

Common uses

• Brushing
• Cleaner
• Finishing
• Remove Polishing

219 Scrubber

Features

• Single-sided abrasive brush
• Tough reinforced conveyor belt supports small parts

2300 Series Chemical Cleaning System

Available Conveyor Widths

• 15″
• 20″
• 30″

Common Processes

• Cleaner (Stand Alone)
• Alkaline Clean to Acid Clean
• Custom Size (1 to as many chambers as you want)

Common Chemicals

• Acid Cleaner
• Alkaline Cleaner

2300 Series Developing System

Available Conveyor Widths

• 15″
• 20″
• 30″

Common Processes

• Custom Size (1 to as many chambers as you want)
• Developer (Stand Alone)
• DES (Develop – Etch – Strip)

Common Chemicals

• 1% Potassium Carbonate
• 1% Sodium Carbonate

Common Resists

• dry film photoresists
• liquid photoresists
• Aqueous solder mask resist (dry and liquid)
• And many more resists

2300 Series Dryer

Available Conveyor Widths

• 15″
• 20″
• 30″
• 40″

Features

• Stand-alone drying system
• Portable unit (move anywhere in the shop) or fix it in place

2300 Series Etching System

Available Conveyor Widths

• 15″
• 20″
• 30″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• Etcher (Stand Alone)
• SES (Strip – Etch – Strip)

Common Chemicals

• Alkaline Etchant
• Cupric Chloride Etchant
• Ferric chloride Etchant
• Hydrofluoric Acid (HF)
• Micro etch

Common Materials Etched

• Aluminum
• Copper
• Glass
• Steel
• Titanium
• And more

2300 Series Stripping System

Available Conveyor Widths

• 15″
• 20″
• 30″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• SES (Strip – Etch – Strip)
• Stripper (Stand Alone)

Common Chemicals

• Metal Resist Stripper
• Proprietary Aqueous or Semi-Aqueous Stripper
• Potassium Hydroxide
• Sodium Hydroxide

2800 Drawer Etcher

Features

• An adjustable drawer type rack
• Loads parts horizontally up to size 21″ x 21″
• Oscillating spray tubes
• Oscillating rack to maximize etchant movement

604 Deburrer

Features

• 2 oscillating brushes
• Built-in Rinse and Dryer

Common uses

• Post PCB drilling
• Post punching operations

CC8000 Chemical Cleaning System

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Cleaner (Stand Alone)
• Alkaline Clean to Acid Clean
• Custom Size (1 to as many chambers as you want)

Common Chemicals

• Acid Cleaner
• Alkaline Cleaner

CC8000 Developing Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• Developer (Stand Alone)
• DES (Develop – Etch – Strip)

Common Chemicals

• 1% Potassium Carbonate
• 1% Sodium Carbonate

Common Resists

• dry film photoresists
• liquid photoresists
• Aqueous solder mask resist (dry and liquid)
• And many more resists

CC8000 Etching Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• Etcher (Stand Alone)
• SES (Strip – Etch – Strip)

Common Chemicals

• Alkaline Etchant
• Cupric Chloride Etchant
• Ferric chloride Etchant
• Hydrofluoric Acid (HF)
• Micro etch

Common Materials Etched

• Aluminum
• Copper
• Glass
• Steel
• Titanium
• And more

CC8000 Stripping Systems

Available Conveyor Widths

• 20″
• 30″
• 40″
• 50″
• 60″

Common Processes

• Custom Size (1 to as many chambers as you want)
• DES (Develop – Etch – Strip)
• SES (Strip – Etch – Strip)
• Stripper (Stand Alone)

Common Chemicals

• Sodium Hydroxide
• Potassium Hydroxide
• Proprietary Aqueous or Semi-Aqueous Stripper
• Metal Resist Stripper

Etch Adjust Module (EAM)

Add EAM to

• CC8000 Etching Systems
• XLi Etching Systems

Advantages

• Plated boards: Correct side to side etch difference when one side is plated more
• Fine-tune very small features

936 Web Filtering System

Removes these from rinse water: Metal fines, Brush particles, Oils and other contaminates.

Ion Exchange System

Features

• Closed-loop system
• Decrease your water usage by connecting an ion exchange to your rinse water